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- Cell Pattern: HQ variants search a wider cell neighbourhood and anti-alias. - Advanced Spill Suppressor: Tolerance, Desaturate, Spill Color Correction. - Inner/Outer Key: Additional Foreground / Background 1-10 and Cleanup Foreground / Background 1-10 brush strokes (older single masks migrate to slot 1). Co-Authored-By: Claude Opus 5.5 <noreply@anthropic.com>